All of the technologies we rely on are powered by semiconductor computer chips that continue to innovate in the miniaturization of their features. Smaller features lead to smaller tolerances in manufacturing, meaning that uniform and rapidly adaptable cooling is indispensable to the photolithography process. This project evaluated the feasibility of a vortex tube for cooling the photolithography machines used in semiconductor manufacturing for ASML. Theoretical, computational, and experimental methods were developed to quantitatively study the feasibility of using the vortex tube in this application. Experiments were designed and fabricated to simulate the chip manufacturing process. The vortex tube, with future work, was found to be a viable alternative to current cooling systems.

• This report represents the work of one or more WPI undergraduate students submitted to the faculty as evidence of completion of a degree requirement. WPI routinely publishes these reports on its website without editorial or peer review.

Creator

• Rosa, Kimberly R.
• Ruiz-Cadalso, Daniel Alberto
• Duarte, Devin Joshua

Publisher

• Worcester Polytechnic Institute

Identifier

• E-project-050117-132831

Advisor

• Furlong-Vazquez, Cosme

Year

• 2017

Sponsor

• ASML Holding

Date created

• 2017-05-01

Resource type

• Major Qualifying Project

Major

• Mechanical Engineering

Rights statement

• In Copyright