Student Work
Residual Stress in RF MEMS switches
PublicRF MEMS cantilever beam switches have many applications; however the residual stress built into these devices during fabrication constricts their use. During fabrication, the electroplating process was believed to be the main culprit of stress. The temperature and the time, which affects the bridge thickness, were varied. It was found that as both the temperature and thickness increased the residual stress increased. The residual stress observed was due to temperature gradients as well as chemical stability of the plating solution.
- This report represents the work of one or more WPI undergraduate students submitted to the faculty as evidence of completion of a degree requirement. WPI routinely publishes these reports on its website without editorial or peer review.
- Creator
- Publisher
- Identifier
- 04D108M
- Advisor
- Year
- 2004
- Date created
- 2004-01-01
- Resource type
- Major
- Rights statement
- Last modified
- 2021-10-11
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